Double Exposure Mask Aligner (DS series)

‧High Quality Exposure Optics
‧High Resolution Capability
‧High Precision Alignment Stage
‧Double side Exposure Stage
‧Wedge Error Compensation
‧Reasonable Price
‧PLC Control
‧Precise Gap Setting
‧Reliable and Stable
‧Substrate thickness: 0.35mm at least


Light Source
* 350 Watt UV power supply
* Wavelength : 350nm-450nm 
* 365 nm Beam Intensity : 15-20 mW/cm2 
* Uniform Beam Size:  4.0" Diameter 
* Beam Uniformity: ±5% over 4" Diameter
* Beam Angle < 2.0 deg
* 365nm/405nm sensors feedback control
Top Side Microscope System
* Four lens Alignment System 
* Two lens for alignment key, Two lens for edge alignment
* Image Magnification : 80x-500x (L-R)
* Two 19 inch monitors with image splitter
* LED coaxial illumination
* Lens movement range XYZ : 20mm 
* Prism Block: alignment mark down to 15mm
Alignment Stage
* Substrate X, Y travel range: 10mm
* Bottom mask X, Y  travel range: 5mm
* θ rotation range: ±10 deg
* Proximity gap range : 0-3mm
* Accuracy: 2um 
* With Proximity and Contact exposure mode 
* Wedge Error Compensation (WEC) 
Operating Interface
* PLC control .
* Exposure timer setting up to 999.9 sec.
* Switch for easy mask change.
* Emergency stop button.
*Mask Holder
*Substrate clamp
*Substrate thickness: 0.35mm at least
*Substrate material: specified
* Anti-vibration Table
* Vacuum pump
UV Lamp
*350/500W Hg Arc lamp